Randomly Selected Images out of 7
A MICRO/NANO SENSORS & SYSTEMS COMPANY
|   8 foot HDPE wet station (IAS) with Photoresist   |
|   (Deep Trench) Spraying System   |
   (Sale Unit SU71-03)   


CONDITION

  Multi-Purpose HDPE Wet Bench Configured for Photoresist Spraying.
   Current configuration:
   Linear Drive for the Air Brush (produces incremental radial movement on the wafer)
   Rotary Control of the wafer on a stage with precision control
   Air pressure regulation for Photoresist flow control and drying time,
   Laptop for controlling motions and air valves.

DESCRIPTION:

  The Spray station was designed in-house. The main features include uniformity of spray, and
   air and PR flow controls so that the spray drys without puddling deep etched trenches.

Possible Reconfiguration

  This wet bench can easily be configured as Wet Bench for corrosive chemicals similar to SU71-02.

The Wet Bench is in use in current configuration. Dimensions: 98" wide X 93" High X 36 " Deep

It is available for inspection by appointments

Pricing negotiable. Make Offers.

EQUIPMENT PHOTOS

PR Spray Bench View 1

SINGLE

     

PR Spray Bench View 2

SINGLE

     

PR Spray Chamber

SINGLE

     

Air Switch and Regulator

SINGLE

     

Computer Monitor Display

SINGLE

     

Linear Drive for Air Brush

SINGLE

     

Air Brush View 1

SINGLE

     

Air Brush View 2

SINGLE

     

Wafer View 1

SINGLE

     

Wafer View 2

SINGLE

     

Spray Chamber View 2

SINGLE

     


  • Return to TOUR and SALE PAGE HOME